Horizon-type Spin Dryer
There are three types: full automatic, semi automatic, and manual.
Stand-alone Spin Dryers with various lineups (wafer centrifugal dryer)
There are a variety of options such as Full Automatic Balancing device (FAB) , heaters, or rinsing of a chamber.
With our original balancing technology, we realize drying with a 6-in and an 8-in cassette as well as 2 cassettes of
3-in, 4-in, 5-in, or 6-in or 2 cassettes of 3-in, 4-in, or 8-in to meet your requirements.
Equipped with FAB, you can dry with a difference from 0 to 25 wafers without using dummy wafers.
By installing to the rotating unit of Spin Dryer, the automatic balancing device will control the vibration even with unbalanced wafer numbers. The breakthrough device has been developed with the vibration analyzing technology over the years.
The device will be most effective under when dealing with the weight difference due to variation of wafer kinds or fluctuation in wafer numbers.
The device is also recommended to eliminate vibration even when there is not so much weight difference or wafer number difference, or when different-sized wafers are used.
Best for less difference in wafer numbers. Easier to install and operate.
More users use this with manual Spin Dryers.
Perfect when there is variation of wafer kinds or fluctuation in wafer numbers.
No need adjust number of wafers,Operator can focus other works.
No need dummy wafer,you can keep chamber clean.
Sliding lid enables a robot to move freely above Spin Dryer and thus saves time significantly including the lid opening and closing time.
・Saves the lid opening and closing time.
・Moving space of a robot is highly unlimited.
・Standing by above Spin Dryer, a robot can insert wafers right after the lid opens.
Drying efficiency is improved with a heater attached to the opening part taking warm air into the chamber.
Works best with smaller difference in wafer number.
The evaluation of 5 or less particles of 0.16 μ or more was highly rated by O Laboratory at Tohoku University, which was with the Spin Dryer of basically standard specifications.
1.Prepare bare wafers. Measure an initial value with a particle counter.
2.Perform drying operation. (1,000 min-¹ 480 s)
3.Measure a value with a particle counter.
| Particle counter | SFS6420 KLA-Tenco | |
|---|---|---|
| Test wafer | 8-in silicon wafer (SLOT 1,4,7) | |
| Spin Dryer | OKH-800series 7-wafer cassette Horizon-type 1 cassette Simple Balancer installed Standard shaft mechanism |
|
| （µｍ） | SLOT 1 | SLOT 4 | SLOT 7 | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Ini. | Aft. | Diff. | Ini. | Aft. | Diff. | Ini. | Aft. | Diff. | |
| 0.160-0.200 | 0 | 1 | 1 | 0 | 3 | 3 | 1 | 2 | 1 |
| 0.200-0.300 | 1 | 0 | -1 | 2 | 3 | 1 | 0 | 0 | 0 |
| 0.300-0.400 | 0 | 1 | 1 | 0 | 0 | 0 | 1 | 1 | 0 |
| 0.400-0.500 | 0 | 1 | 1 | 0 | 1 | 1 | 0 | 0 | 0 |
| 0.500-0.700 | 0 | 1 | 1 | 0 | 0 | 0 | 0 | 1 | 1 |
| 0.700-0.900 | 0 | 0 | 0 | 0 | 1 | 1 | 0 | 0 | 0 |
| 0.900-1.20 | 0 | 0 | 0 | 1 | 0 | -1 | 0 | 0 | 0 |
| A/C | 1 | 0 | -1 | 0 | 0 | 0 | 0 | 1 | 1 |
| TOTAL | 2 | 4 | 2 | 3 | 8 | 5 | 2 | 5 | 3 |
| Model |
Automatic Type
 |
Semi-auto or Manual Type
 |
||
|---|---|---|---|---|
| Revolution | 2-6inch | Max 1,000min-¹ | ||
| ８inch | ||||
| １２inch | Max 700min-¹ | |||
| Dimensions | 2-6inch | 750×1350×1100 (mm) | 750×1430×1100 (mm) | |
| ８inch | 850×1450×1150 (mm) | 850×1530×1150 (mm) | ||
| １２inch | 1050×1700×1170 (mm) | 1050×1780×1170 (mm) | ||
| Type | Horizon downflow type spin dryer | |
|---|---|---|
| Size of wafers for use | 2-12inch | |
| Power source | AC200V （50/60Hz) | |
| Cradle | Possible to mount 2 or 4 cradles | |
| Speed setting | 1st-speed, 2nd-speed | |
| Material | SUS316L (EP) for both turn table and cradle | |
| Exterior | PVC | |
| Safety feature | Automatic stop upon unusual vibrations, overload operation prevention | |
| Start-up time | 30 seconds or less(12in) / 25 seconds or less(∼8in) | |
