Virtical-type for Single Cassette
Spin Rinse Dryer(SRD)
The Spin Rinse Dryer (Option Rinse function=Known as SRD,Spin rinse dryer,Rinser dryer)is a device in which water drops and moisture on a wafer can be dried using a mechanism of centrifugal force caused by spinning and an action of the suction of air current.
It is possible to dry even fine and thin pieces of wafer cleanly and safely by using Ohmiya Industries' balancing technique and air current control which maximize the efficiency of drying work pieces.
Created for 8inch t=2mm wafer. The door can be opened and closed even if the workpiece is heavy and both hands are blocked.
No need of troublesome rotor changing. Tool-less and no adjusment for wafer carrier casette change.
Twice as quick drying performance in the space of 1 unit.
Applicable to square type substrates or special types. Consult with us if interested.
| Model |
For 6inch
 |
For 8inch
|
|---|---|---|
| Size of wafers for use | 2-6inch | 2-8inch |
| Dimensions | W423×D839×H780 (mm) | W513×D903×H880 (mm) |
| Exterior package | Front: SUS304, Side and Rear: PVC | |
| Rotor material | SUS304 electropolished | |
| Ionizer | Standard equipment | |
| Filter | ULPA / HEPA selectable | |
| Revolution | Max 3,000min-¹ | Max 2,500min-¹ |
| Timer | 1st to 8rd speed (0 to 999 sec. possible to set in 8 stages) | |
| Safety mechanism | Front side lid close check sensor, door lock mechanism | |
| Power source | 3P AC200V±10% 50/60 Hz (Terminal block) | |
|---|---|---|
| Drive air | Clean dry air | |
| Pressure: 0.5 MPa or more | ||
| Air consumption: 250 L/min (ANR) | ||
| Exhaust port | VP50A, One location (From chamber) | |
| （Exhaust 800L/min∼1000L/min） | ||
| Drain | VP25A One location (From chamber) | |
